Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide

Journal article
(Original article)


Publication Details

Author(s): Yang RB, Bachmann J, Reiche M, Gerlach JW, Goesele U, Nielsch K
Journal: Chemistry of Materials
Publisher: American Chemical Society
Publication year: 2009
Volume: 21
Pages range: 2586-2588
ISSN: 0897-4756


FAU Authors / FAU Editors

Bachmann, Julien Prof.
Lehrstuhl für Chemistry of thin film materials


External institutions
Leibniz-Institute für Oberflächenmodifizierung e. V. (IOM) / Leibniz Institute of Surface Modification
Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics
Universität Hamburg


How to cite

APA:
Yang, R.B., Bachmann, J., Reiche, M., Gerlach, J.W., Goesele, U., & Nielsch, K. (2009). Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide. Chemistry of Materials, 21, 2586-2588. https://dx.doi.org/10.1021/cm900623v

MLA:
Yang, Ren Bin, et al. "Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide." Chemistry of Materials 21 (2009): 2586-2588.

BibTeX: 

Last updated on 2018-06-07 at 07:23