Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide

Yang RB, Bachmann J, Reiche M, Gerlach JW, Goesele U, Nielsch K (2009)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2009

Journal

Chemistry of Materials American Chemical Society

Publisher: American Chemical Society

Book Volume: 21

Pages Range: 2586-2588

DOI: 10.1021/cm900623v

Authors with CRIS profile

Julien Bachmann Lehrstuhl für Chemistry of thin film materials

Involved external institutions

Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics DE Germany (DE) Universität Hamburg (UHH) DE Germany (DE) Leibniz-Institute für Oberflächenmodifizierung e. V. (IOM) / Leibniz Institute of Surface Modification DE Germany (DE)

How to cite

APA:

Yang, R.B., Bachmann, J., Reiche, M., Gerlach, J.W., Goesele, U., & Nielsch, K. (2009). Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide. Chemistry of Materials, 21, 2586-2588. https://dx.doi.org/10.1021/cm900623v

MLA:

Yang, Ren Bin, et al. "Atomic Layer Deposition of Antimony Oxide and Antimony Sulfide." Chemistry of Materials 21 (2009): 2586-2588.

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