Finite integration (FI) method for modeling optical wavers in lithography masks

Erdmann A, Pflaum C, Rahimi Z (2009)


Publication Type: Conference contribution, Conference Contribution

Publication year: 2009

Pages Range: ?

Conference Proceedings Title: 7th International Fraunhofer IISB Lithography Simulation Workshop

Event location: Hersbruck

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APA:

Erdmann, A., Pflaum, C., & Rahimi, Z. (2009). Finite integration (FI) method for modeling optical wavers in lithography masks. In 7th International Fraunhofer IISB Lithography Simulation Workshop (pp. ?). Hersbruck.

MLA:

Erdmann, Andreas, Christoph Pflaum, and Zhabiz Rahimi. "Finite integration (FI) method for modeling optical wavers in lithography masks." Proceedings of the 7th International Fraunhofer IISB Lithography Simulation Workshop, Hersbruck 2009. ?.

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