Preparation and characterization of ultrathin [Ru(CO) 3Cl 2] 2 and [BMIM][Tf 2N] films on Al 2O 3/NiAl(110) under UHV conditions

Journal article
(Original article)

Publication Details

Author(s): Sobota M, Schernich S, Schulz H, Hieringer W, Paape N, Wasserscheid P, Görling A, Laurin M, Libuda J
Journal: Physical Chemistry Chemical Physics
Publisher: Royal Society of Chemistry
Publication year: 2012
Volume: 14
Journal issue: 30
Pages range: 10603-10612
ISSN: 1463-9076
eISSN: 1463-9084


Towards a better understanding of the interface chemistry of ionic liquid (IL) thin film catalytic systems we have applied a rigorous surface science model approach. For the first time, a model homogeneous catalyst has been prepared under ultrahigh vacuum conditions. The catalyst, di-μ- chlorobis(chlorotricarbonylruthenium) [Ru(CO) Cl ] , and the solvent, the IL 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide [BMIM][Tf N], have been deposited by physical vapor deposition onto an alumina model support [Al O /NiAl(110)]. First, the interaction between thin films of [Ru(CO) Cl ] and the support is investigated. Then, the ruthenium complex is co-deposited with the IL and the influence of the solvent on the catalyst is discussed. D O, which is a model reactant, is further added. Growth, surface interactions, and mutual interactions in the thin films are studied with IRAS in combination with density functional (DFT) calculations. At 105 K, molecular adsorption of [Ru(CO) Cl ] is observed on Al O /NiAl(110). The IRAS spectra of the binary [Ru(CO) Cl ] + [BMIM][Tf N] and ternary [Ru(CO) Cl ] + [BMIM][Tf N] + D O show every characteristic band of the individual components. Above 223 K, partial decomposition of the ruthenium complex leads to species of molecular nature attributed to Ru(CO) and Ru(CO) surface species. Formation of metallic ruthenium clusters occurs above 300 K and the model catalyst decomposes further at higher temperatures. Neither the presence of the IL nor of D O prevents this partial decomposition of [Ru(CO) Cl ] on alumina. © 2012 the Owner Societies.

FAU Authors / FAU Editors

Görling, Andreas Prof. Dr.
Lehrstuhl für Theoretische Chemie
Hieringer, Wolfgang PD Dr.
Lehrstuhl für Theoretische Chemie
Laurin, Mathias Dr.
Lehrstuhl für Physikalische Chemie II
Libuda, Jörg Prof. Dr.
Professur für Physikalische Chemie
Schernich, Stefan
Lehrstuhl für Physikalische Chemie II
Schulz, Hannes
Lehrstuhl für Theoretische Chemie
Sobota, Marek
Graduiertenzentrum der FAU
Wasserscheid, Peter Prof. Dr.
Lehrstuhl für Chemische Reaktionstechnik

Additional Organisation
Exzellenz-Cluster Engineering of Advanced Materials

How to cite

Sobota, M., Schernich, S., Schulz, H., Hieringer, W., Paape, N., Wasserscheid, P.,... Libuda, J. (2012). Preparation and characterization of ultrathin [Ru(CO) 3Cl 2] 2 and [BMIM][Tf 2N] films on Al 2O 3/NiAl(110) under UHV conditions. Physical Chemistry Chemical Physics, 14(30), 10603-10612.

Sobota, Marek, et al. "Preparation and characterization of ultrathin [Ru(CO) 3Cl 2] 2 and [BMIM][Tf 2N] films on Al 2O 3/NiAl(110) under UHV conditions." Physical Chemistry Chemical Physics 14.30 (2012): 10603-10612.


Last updated on 2019-09-04 at 14:51