Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment

Walther S, Polster S, Jank MPM, Thiem H, Ryssel H, Frey L (2011)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2011

Journal

Book Volume: 22

Pages Range: 253-256

Journal Issue: 2

DOI: 10.1016/j.apt.2011.01.012

Abstract

In this work, the charge carrier density of ZnO nanoparticle films was modified after deposition and annealing by an oxygen plasma treatment. The respective films were utilized as active layers in thin film transistors. For a discussion of the plasma--surface interaction on the molecular level, the electrical behavior of the layers was investigated which in general is highly sensitive to low level variations in defect or doping densities. A treatment with remote oxygen plasma at 400~W for 10~s led to a shift of the turn-on voltage from $-$12 to 4~V and a reduction of the off-current by more than two orders of magnitude. A model for the influence of oxygen species adsorbed to ZnO nanoparticle surfaces on electrical characteristics of ZnO nanoparticle thin film transistors is introduced.

Authors with CRIS profile

Additional Organisation(s)

Involved external institutions

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) Germany (DE) Evonik Degussa GmbH Germany (DE)

How to cite

APA:

Walther, S., Polster, S., Jank, M.P.M., Thiem, H., Ryssel, H., & Frey, L. (2011). Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment. Advanced Powder Technology, 22(2), 253-256. https://dx.doi.org/10.1016/j.apt.2011.01.012

MLA:

Walther, Sabine, et al. "Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment." Advanced Powder Technology 22.2 (2011): 253-256.

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