Characterization of the scattering effect of complex mask geometries with surface roughness

Conference contribution
(Conference Contribution)


Publication Details

Author(s): Pflaum C, Rahimi Z, Erdmann A
Title edited volumes: Proceedings of SPIE - The International Society for Optical Engineering
Publication year: 2010
Volume: 7717
Conference Proceedings Title: Optical Modelling and Design
Pages range: 771709-771709-12
ISBN: 9780819481900
ISSN: 0277-786X


Abstract


We present a finite integration technique (FIT) simulator for modelling light diffraction from lithographic masks with complex shapes. This method has high flexibility in geometrical modelling and treating curved boundaries. The inherent feature of FIT allows more accurate electromagnetic field simulation in complex structures. This technique is also suited for fast EMF simulations and large 3D problems because of its parallelisation potential. We applied this method to investigate the effect of complex mask shapes on the printed image. We demonstrate results for a phase-shift mask (PSM) with footing extensions and surface roughness. © 2010 SPIE.



FAU Authors / FAU Editors

Erdmann, Andreas PD Dr.
Technische Fakultät
Pflaum, Christoph Prof. Dr.
Professur für Informatik (Numerische Simulation mit Höchstleistungsrechnern)
Rahimi, Zhabiz
Graduiertenzentrum der FAU


How to cite

APA:
Pflaum, C., Rahimi, Z., & Erdmann, A. (2010). Characterization of the scattering effect of complex mask geometries with surface roughness. In Optical Modelling and Design (pp. 771709-771709-12). Brüssel.

MLA:
Pflaum, Christoph, Zhabiz Rahimi, and Andreas Erdmann. "Characterization of the scattering effect of complex mask geometries with surface roughness." Proceedings of the SPIE Photonics Europe, Brüssel 2010. 771709-771709-12.

BibTeX: 

Last updated on 2019-17-01 at 16:37