Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005)

Vila-Comamala J, Jefimovs K, Raabe J, Pilvi T, Fink R, Senoner M, Maassdorf A, Ritala M, David C (2010)

Publication Type: Journal article, Erratum

Publication year: 2010

Journal

Ultramicroscopy Elsevier

Original Authors: Vila-Comamala J., Jefimovs K., Raabe J., Pilvi T., Fink R.H., Senoner M., Maassdorf A., Ritala M., David C.

Publisher: Elsevier

Book Volume: 110

Journal Issue: 2

DOI: 10.1016/j.ultramic.2009.11.012

Authors with CRIS profile

Rainer Fink Professur für Physikalische Chemie

Involved external institutions

Paul Scherrer Institute (PSI) CH Switzerland (CH) Helsingin yliopisto / University of Helsinki FI Finland (FI) Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH) DE Germany (DE) Bundesanstalt für Materialforschung und -prüfung (BAM) DE Germany (DE) Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) / Swiss Federal Laboratories for Materials Science & Technology CH Switzerland (CH)

How to cite

APA:

Vila-Comamala, J., Jefimovs, K., Raabe, J., Pilvi, T., Fink, R., Senoner, M.,... David, C. (2010). Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005). Ultramicroscopy, 110(2). https://doi.org/10.1016/j.ultramic.2009.11.012

MLA:

Vila-Comamala, Joan, et al. "Erratum to "advanced thin film technology for ultrahigh resolution X-ray microscopy" [Ultramicroscopy 109 (2009) 1360-1364] (DOI:10.1016/j.ultramic.2009.07.005)." Ultramicroscopy 110.2 (2010).

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