An image processing approach to approximating interface textures of microcrystalline silicon layers grown on existing aluminum-doped zinc oxide textures

Hertel K, Hüpkes J, Pflaum C (2013)


Publication Type: Journal article, Original article

Publication year: 2013

Journal

Publisher: Optical Society of America

Book Volume: 21

Pages Range: A977--A990

Journal Issue: 56

URI: http://www.opticsinfobase.org/oe/viewmedia.cfm?uri=oe-21-S6-A977&seq=0

DOI: 10.1364/OE.21.00A977

Abstract

We present an algorithm for generating a surface approximation of microcrystalline silicon (mc-Si) layers after plasma enhanced chemical vapor deposition (PECVD) onto surface textured substrates, where data of the textured substrate surface are available as input.We utilize mathematical image processing tools and combine them with an ellipsoid generator approach. The presented algorithm has been tuned for use in thin-film silicon solar cell applications, where textured surfaces are used to improve light trapping. We demonstrate the feasibility of this method by means of optical simulations of generated surface textures, comparing them to simulations of measured atomic force microscopy (AFM) scan data of both Aluminum-doped zinc oxide (AZO, a transparent and conductive material) and mc-Si layers. © 2013 Optical Society of America.

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APA:

Hertel, K., Hüpkes, J., & Pflaum, C. (2013). An image processing approach to approximating interface textures of microcrystalline silicon layers grown on existing aluminum-doped zinc oxide textures. Optics Express, 21(56), A977--A990. https://dx.doi.org/10.1364/OE.21.00A977

MLA:

Hertel, Kai, Jürgen Hüpkes, and Christoph Pflaum. "An image processing approach to approximating interface textures of microcrystalline silicon layers grown on existing aluminum-doped zinc oxide textures." Optics Express 21.56 (2013): A977--A990.

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