Stoichiometry of Nickel Oxide Films Prepared by ALD

Journal article
(Original article)


Publication Details

Author(s): Bachmann J, Zolotaryov A, Albrecht O, Goetze S, Berger A, Hesse D, Novikov D, Nielsch K
Journal: Chemical Vapor Deposition
Publisher: Wiley-VCH Verlag
Publication year: 2011
Volume: 17
Pages range: 177-+
ISSN: 0948-1907


Abstract


Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.



FAU Authors / FAU Editors

Bachmann, Julien Prof.
Lehrstuhl für Chemistry of thin film materials


External institutions
Deutsches Elektronen-Synchrotron DESY
Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics
Universität Hamburg


How to cite

APA:
Bachmann, J., Zolotaryov, A., Albrecht, O., Goetze, S., Berger, A., Hesse, D.,... Nielsch, K. (2011). Stoichiometry of Nickel Oxide Films Prepared by ALD. Chemical Vapor Deposition, 17, 177-+. https://dx.doi.org/10.1002/cvde.201004300

MLA:
Bachmann, Julien, et al. "Stoichiometry of Nickel Oxide Films Prepared by ALD." Chemical Vapor Deposition 17 (2011): 177-+.

BibTeX: 

Last updated on 2018-11-08 at 03:01