Stoichiometry of Nickel Oxide Films Prepared by ALD

Journal article
(Original article)

Publication Details

Author(s): Bachmann J, Zolotaryov A, Albrecht O, Goetze S, Berger A, Hesse D, Novikov D, Nielsch K
Journal: Chemical Vapor Deposition
Publisher: Wiley-VCH Verlag
Publication year: 2011
Volume: 17
Pages range: 177-+
ISSN: 0948-1907


Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.

FAU Authors / FAU Editors

Bachmann, Julien Prof.
Lehrstuhl für Chemistry of thin film materials

External institutions with authors

Deutsches Elektronen-Synchrotron DESY
Max-Planck-Institut für Mikrostrukturphysik (MSP) / Max Planck Institute for Microstructure Physics
Universität Hamburg

How to cite

Bachmann, J., Zolotaryov, A., Albrecht, O., Goetze, S., Berger, A., Hesse, D.,... Nielsch, K. (2011). Stoichiometry of Nickel Oxide Films Prepared by ALD. Chemical Vapor Deposition, 17, 177-+.

Bachmann, Julien, et al. "Stoichiometry of Nickel Oxide Films Prepared by ALD." Chemical Vapor Deposition 17 (2011): 177-+.


Last updated on 2018-11-08 at 03:01