Stoichiometry of Nickel Oxide Films Prepared by ALD

Bachmann J, Zolotaryov A, Albrecht O, Goetze S, Berger A, Hesse D, Novikov D, Nielsch K (2011)


Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2011

Journal

Publisher: Wiley-VCH Verlag

Book Volume: 17

Pages Range: 177-+

DOI: 10.1002/cvde.201004300

Abstract

Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.

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APA:

Bachmann, J., Zolotaryov, A., Albrecht, O., Goetze, S., Berger, A., Hesse, D.,... Nielsch, K. (2011). Stoichiometry of Nickel Oxide Films Prepared by ALD. Chemical Vapor Deposition, 17, 177-+. https://dx.doi.org/10.1002/cvde.201004300

MLA:

Bachmann, Julien, et al. "Stoichiometry of Nickel Oxide Films Prepared by ALD." Chemical Vapor Deposition 17 (2011): 177-+.

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