Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper

Sarkar S, Li J, Cox WT, Bitzek E, Lenosky TJ, Wang Y (2012)


Publication Type: Journal article

Publication year: 2012

Journal

Book Volume: 86

Journal Issue: 1

DOI: 10.1103/PhysRevB.86.014115

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How to cite

APA:

Sarkar, S., Li, J., Cox, W.T., Bitzek, E., Lenosky, T.J., & Wang, Y. (2012). Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper. Physical Review B, 86(1). https://doi.org/10.1103/PhysRevB.86.014115

MLA:

Sarkar, Sanket, et al. "Finding activation pathway of coupled displacive-diffusional defect processes in atomistics: Dislocation climb in fcc copper." Physical Review B 86.1 (2012).

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