Narrow long Josephson junctions

Koval Y, Wallraff A, Fistul M, Thyssen N, Kohlstedt H, Ustinov A (1999)


Publication Language: English

Publication Type: Journal article

Publication year: 1999

Journal

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

Book Volume: 9

Pages Range: 3957

URI: http://www.fluxongroup.physik.uni-erlangen.de/publications/1999/koval99.html

DOI: 10.1109/77.783894

Abstract

Long Josephson junctions of width down to less than 0.3 pm are fabricated using electron beam lithography. The junctions are made in niobiumaluminum-oxide trilayer technology using cross-linked PMMA for insulation. We measured the fluxon penetration field, the magnetic field period of the critical current modulation, and the Fiske step voltages of the junctions. A strong dependence of these quantities on the junction width is observed. Assuming a general-type relation between the spatial derivative of the phase and the spatial variation of the magnetic field along the plane of the junction, we derive a scaling relation between the measured quantities depending on the junction width. The derived relation is consistent with the experimental data. © 1999 IEEE.

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APA:

Koval, Y., Wallraff, A., Fistul, M., Thyssen, N., Kohlstedt, H., & Ustinov, A. (1999). Narrow long Josephson junctions. IEEE Transactions on Applied Superconductivity, 9, 3957. https://dx.doi.org/10.1109/77.783894

MLA:

Koval, Yury, et al. "Narrow long Josephson junctions." IEEE Transactions on Applied Superconductivity 9 (1999): 3957.

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