Etschel S, Portilla Berlanga L, Kirschner J, Drost M, Marbach H, Tykwinski R, Halik M (2015)
Publication Language: English
Publication Type: Journal article, Report
Publication year: 2015
Book Volume: 54
Pages Range: 9235–9238
Journal Issue: 32
URI: http://onlinelibrary.wiley.com/doi/10.1002/anie.201501957/abstract
A method for the region-selective deposition of nanoparticles (NPs) by the Huisgen 1,3-dipolar cycloaddition is presented. The approach enables defined stacking of various oxide NPs in any order with control over layer thickness. Thereby the reaction is performed between a substrate, functionalized with a self-assembled monolayer of an azide-bearing phosphonic acid (PA) and aluminum oxide (AlOx) NPs functionalized with an alkyne bearing PA. The layer of alkyne functionalized AlOx NPs is then used as substrate for the deposition of azide-functionalized indium tin oxide (ITO) NPs to provide a binary stack. This progression is then conducted with alkyne-functionalized CeO2 NPs, yielding a ternary stack of NPs with three different NP cores. The stacks are characterized by AFM and SEM, defining the region-selectivity of the deposition technique. Finally, these assemblies have been tested in devices as a dielectric to form a capacitor resulting in a dramatic increase in the measured capacitance.
APA:
Etschel, S., Portilla Berlanga, L., Kirschner, J., Drost, M., Marbach, H., Tykwinski, R., & Halik, M. (2015). Region-selective Deposition of Core–Shell Nanoparticles for 3 D Hierarchical Assemblies by the Huisgen 1,3-Dipolar Cycloaddition. Angewandte Chemie International Edition, 54(32), 9235–9238. https://dx.doi.org/10.1002/anie.201501957
MLA:
Etschel, Sebastian, et al. "Region-selective Deposition of Core–Shell Nanoparticles for 3 D Hierarchical Assemblies by the Huisgen 1,3-Dipolar Cycloaddition." Angewandte Chemie International Edition 54.32 (2015): 9235–9238.
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