Formation of a Non-Thickness-Limited Titanium Dioxide Mesosponge and its Use in Dye-Sensitized Solar Cells

Kim DH, Lee K, Roy P, Birajdar B, Spiecker E, Schmuki P (2009)

Publication Status: Published

Publication Type: Journal article

Publication year: 2009

Journal

Angewandte Chemie International Edition Wiley

Publisher: Wiley-VCH Verlag

Book Volume: 48

Pages Range: 9326-9329

Journal Issue: 49

DOI: 10.1002/anie.200904455

Abstract

Etch a sketch: Robust TiO$_2$ mesoporous layers can be fabricated on Ti surfaces by a combination of non-thickness-limited anodization and selective etching. Layers more than 50 \textgreekmm thick with highly regular feature and pore sizes in the range 5--10 nm can be produced (see picture, FTO=fluorine doped tin oxide). The layers are highly flexible, well-adhered, and can be used directly after appropriate annealing in efficient dye-sensitized solar cells.

Authors with CRIS profile

Dam-Hee Kim Institute Materials for Electronics and Energy Technology (i-MEET) Kiyoung Lee Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik) Balaji Birajdar
Erdmann Spiecker Lehrstuhl für Werkstoffwissenschaften (Mikro- und Nanostrukturforschung) Patrik Schmuki Lehrstuhl für Werkstoffwissenschaften (Korrosion und Oberflächentechnik)

Additional Organisation(s)

Exzellenz-Cluster Engineering of Advanced Materials Interdisziplinäres Zentrum, Center for Nanoanalysis and Electron Microscopy (CENEM)

How to cite

APA:

Kim, D.-H., Lee, K., Roy, P., Birajdar, B., Spiecker, E., & Schmuki, P. (2009). Formation of a Non-Thickness-Limited Titanium Dioxide Mesosponge and its Use in Dye-Sensitized Solar Cells. Angewandte Chemie International Edition, 48(49), 9326-9329. https://dx.doi.org/10.1002/anie.200904455

MLA:

Kim, Dam-Hee, et al. "Formation of a Non-Thickness-Limited Titanium Dioxide Mesosponge and its Use in Dye-Sensitized Solar Cells." Angewandte Chemie International Edition 48.49 (2009): 9326-9329.

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