Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2

Journal article

Publication Details

Author(s): Steinrück HG, Will J, Magerl A, Ocko B
Journal: Langmuir
Publication year: 2015
Volume: 31
Journal issue: 43
Pages range: 11774-11780
ISSN: 0743-7463
eISSN: 1520-5827


The structure of n-alkyltrichlorosilane self-assembled monolayers (SAMs) of alkyl chain lengths n = 12, 14, 18, and 22 formed on the amorphous native oxide of silicon (100) has been investigated via angstrom-resolution surface X-ray scattering techniques, with particular focus on the proliferation of lateral order along the molecules' long axis. Grazing incidence diffraction shows that the monolayer is composed of hexagonally packed crystalline-like domains for n = 14, 18, and 22 with a lateral size of about 60 A. However, Bragg rod analysis shows that similar to 12 of the CH, units are not included in the crystalline-like domains. We assign this, and the limited lateral crystallites' size, to strain induced by the size mismatch between the optimal chain-chain and headgroup-headgroup spacings. Analysis of X-ray reflectivity profiles for n = 12, 14, and 22 shows that the density profile used to successfully model n = 18 provides an excellent fit where the analysis-derived parameters provide complementary structural information to the grazing incidence results.

FAU Authors / FAU Editors

Magerl, Andreas Prof. Dr.
Naturwissenschaftliche Fakultät
Steinrück, Hans-Georg
Lehrstuhl für Kristallographie und Strukturphysik
Will, Johannes Dr.
Lehrstuhl für Kristallographie und Strukturphysik

External institutions
Brookhaven National Laboratory

How to cite

Steinrück, H.-G., Will, J., Magerl, A., & Ocko, B. (2015). Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2. Langmuir, 31(43), 11774-11780.

Steinrück, Hans-Georg, et al. "Structure of n-Alkyltrichlorosilane Mono layers on Si(100)/SiO2." Langmuir 31.43 (2015): 11774-11780.


Last updated on 2018-11-08 at 02:11