Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications

Journal article
(Original article)


Publication Details

Author(s): Daves W, Krauss A, Behnel N, Haeublein V, Bauer A, Frey L
Journal: Thin Solid Films
Publication year: 2011
Volume: 519
Journal issue: 18
Pages range: 5892-5898
ISSN: 0040-6090


FAU Authors / FAU Editors

Frey, Lothar Prof. Dr.
Lehrstuhl für Elektronische Bauelemente


External institutions with authors

Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB)
Robert Bosch GmbH


How to cite

APA:
Daves, W., Krauss, A., Behnel, N., Haeublein, V., Bauer, A., & Frey, L. (2011). Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications. Thin Solid Films, 519(18), 5892-5898. https://dx.doi.org/10.1016/j.tsf.2011.02.089

MLA:
Daves, W., et al. "Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications." Thin Solid Films 519.18 (2011): 5892-5898.

BibTeX: 

Last updated on 2018-22-10 at 14:53