Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications

Daves W, Krauss A, Behnel N, Haeublein V, Bauer A, Frey L (2011)

Publication Status: Published

Publication Type: Journal article, Original article

Publication year: 2011

Journal

Thin Solid Films Elsevier

Book Volume: 519

Pages Range: 5892-5898

Journal Issue: 18

DOI: 10.1016/j.tsf.2011.02.089

Authors with CRIS profile

Lothar Frey Lehrstuhl für Elektronische Bauelemente

Involved external institutions

Robert Bosch GmbH DE Germany (DE) Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie (IISB) DE Germany (DE)

How to cite

APA:

Daves, W., Krauss, A., Behnel, N., Haeublein, V., Bauer, A., & Frey, L. (2011). Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications. Thin Solid Films, 519(18), 5892-5898. https://dx.doi.org/10.1016/j.tsf.2011.02.089

MLA:

Daves, W., et al. "Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications." Thin Solid Films 519.18 (2011): 5892-5898.

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