A simple approach to atom probe sample preparation by using shadow masks

Felfer P, Mccarroll I, Macauley C, Cairney JM (2016)


Publication Status: Published

Publication Type: Journal article

Publication year: 2016

Journal

Publisher: Elsevier

Book Volume: 160

Pages Range: 163-167

DOI: 10.1016/j.ultramic.2015.09.005

Abstract

Here, we present a new method that utilises shadow masks in a broad ion beam system to prepare atom probe samples. It is particularly suited to non-conductors and materials with surface layers such as surface oxides, implanted layers or thin films. This new approach bypasses the focused ion beam (FIB) lift-out step, increasing the sample throughput, dramatically reducing the required FIB beam time and decreasing the complexity of sample preparation. (C) 2015 Elsevier By. All rights reserved.

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APA:

Felfer, P., Mccarroll, I., Macauley, C., & Cairney, J.M. (2016). A simple approach to atom probe sample preparation by using shadow masks. Ultramicroscopy, 160, 163-167. https://dx.doi.org/10.1016/j.ultramic.2015.09.005

MLA:

Felfer, Peter, et al. "A simple approach to atom probe sample preparation by using shadow masks." Ultramicroscopy 160 (2016): 163-167.

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