Maximilian Rumler



Organisation


Lehrstuhl für Elektronische Bauelemente


Project member


(EXC 315: New Materials and Processes - Hierarchical Structure Formation for Functional Devices):
EXC 315/2: Engineering of Nanoelectronic Materials - B6 (Druckbare Elektronik)
Prof. Dr. Lothar Frey
(01/11/2012 - 31/10/2017)


Publications (Download BibTeX)

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Fader, R., Rommel, M., Bauer, A., Rumler, M., Frey, L., Verschuuren, M.A.,... Schoembs, U. (2013). Accuracy of wafer level alignment with substrate conformal imprint lithography. Journal of Vacuum Science & Technology B, 31(6), 6FB02. https://dx.doi.org/10.1116/1.4824696
Rumler, M., Fader, R., Haas, A., Rommel, M., Bauer, A., & Frey, L. (2013). Evaluation of resistless Ga+ beam lithography for UV NIL stamp fabrication. Nanotechnology, 24(36), 365302. https://dx.doi.org/10.1088/0957-4484/24/36/365302
Fader, R., Landwehr, J., Rumler, M., Rommel, M., Bauer, A., Frey, L.,... Kraft, A. (2013). Functional epoxy polymer for direct nano-imprinting of micro-optical elements. Microelectronic Engineering, 110, 90-93. https://dx.doi.org/10.1016/j.mee.2013.02.030
Hackenberg, M., Rommel, M., Rumler, M., Lorenz, J., Pichler, P., Huet, K.,... Quillec, M. (2013). Melt Depth and Time Variations during Pulsed Laser Thermal Annealing with One and More Pulses,. In Solid-State Device Research Conference (ESSDERC), 2013 Proceedings of the European. (pp. 214-217).
Rommel, M., Rumler, M., Haas, A., Bauer, A.J., & Frey, L. (2013). Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching. Microelectronic Engineering, 110, 177-182. https://dx.doi.org/10.1016/j.mee.2013.03.081

Last updated on 2017-14-10 at 02:00