PD Dr. Andreas Erdmann


Technische Fakultät

Publications (Download BibTeX)

Erdmann, A., Evanschitzky, P., Mesilhy, H.M.S., Philipsen, V., Hendrickx, E., & Bauer, M. (2019). Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects? Journal of Micro-Nanolithography MEMS and MOEMS, 18(1). https://dx.doi.org/10.1117/1.JMM.18.1.011005
Pflaum, C., Rahimi, Z., & Erdmann, A. (2010). Characterization of the scattering effect of complex mask geometries with surface roughness. In Optical Modelling and Design (pp. 771709-771709-12). Brüssel.
Rahimi, Z., Erdmann, A., & Pflaum, C. (2009). Finite integration (FI) method for modelling optical waves in lithography masks. In Proceedings of International Conference of "Electromagnetics in Advanced Applications", 2009. ICEAA '09 (pp. 809-812). Turin.

Last updated on 2017-22-12 at 04:50

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