micro resist technology GmbH

Industry / private company

Berlin, Germany

Publications in cooperation with FAU scientists

Förthner, M., Rumler, M., Stumpf, F., Fader, R., Rommel, M., Frey, L.,... Klein, J.J. (2016). Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings. Applied Physics A-Materials Science & Processing, 122(3). https://dx.doi.org/10.1007/s00339-016-9767-6
Fader, R., Schmitt, H., Rommel, M., Bauer, A.J., Frey, L., Ji, R.,... Vogler, M. (2012). Novel organic polymer for UV-enhanced substrate conformal imprint lithography. Microelectronic Engineering, 98, 238-241. https://dx.doi.org/10.1016/j.mee.2012.07.010

Last updated on 2017-18-05 at 07:48