micro resist technology GmbH


Industry / private company

Location:
Berlin, Germany


Publications in cooperation with FAU scientists


Förthner, M., Rumler, M., Stumpf, F., Fader, R., Rommel, M., Frey, L.,... Klein, J.J. (2016). Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings. Applied Physics A-Materials Science & Processing, 122(3). https://dx.doi.org/10.1007/s00339-016-9767-6
Fader, R., Schmitt, H., Rommel, M., Bauer, A.J., Frey, L., Ji, R.,... Vogler, M. (2012). Novel organic polymer for UV-enhanced substrate conformal imprint lithography. Microelectronic Engineering, 98, 238-241. https://dx.doi.org/10.1016/j.mee.2012.07.010

Last updated on 2017-18-05 at 07:48