Influence of photoresist pattern on charging damage during high current ion implantation - Dirnecker, Tobias; Ruf, Alexander; Frey, Lothar; Beyer, A.; Bauer, Anton; Henke, D.; Ryssel, Heiner (7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002, 2002)
Keywords: Ion implantation; Leakage current; Electric breakdown; Electrodes; Resists; MOS capacitors; Performance evaluation; Antenna measurements; Design for quality; Current measurement