Characterization of charging damage in plasma doping - Henke, D.; Walther, Sabine; Weemann, John; Dirnecker, Tobias; Ruf, Alexander; Beyer, Armand; Lee, K. (IEEE Proc. on Ion Implantation TEchnology-2002, 2003)
UnivIS-Import:2015-04-16:Pub.2003.tech.IE.LEB.charac