Detailed arsenic concentration profiles at Si/SiO2 interfaces - Pei, Lirong; Duscher, Gerd; Steen, Christian; Pichler, Peter; Ryssel, Heiner; Napolitani, Enrico; De Salvador, Davide; Piro, Alberto Maria; Terrasi, A. Tonio; Severac, Fabrice; Cristiano, Filadelfo; Ravichandran, Karthik; et al. (Journal of Applied Physics, 2008)
UnivIS-Import:2017-07-10:Pub.2008.tech.IE.LEB.detail_0