Optimization of illumination pupils and mask features for proximity printing - Motzek, K.; Bich, Andreas; Erdmann, Andreas; Hornung, Michael; Hennemeyer, Marc; Meliorisz, Péter-Bálint; Hofmann, Ulrich; Ünal, Nezih; Voelkel, Reinhard; Partel, Stefan; Hudek, Peter (Micro- and Nano-Engineering, 2009)
UnivIS-Import:2017-12-18:Pub.2009.tech.IE.LEB.optimi_6